주요 성분
히알루론산, 글리세린, centella, Opuntia
성분
히알루론산, Opuntia, Centella, Glycerin
특징
Moisturizer, 희게하기, 숨구멍 세탁기술자, 조명
Product Name
Deep Cleaning Bubble Facial Mask
Function
Deep Cleaning, moisturizing
Application
Personal Skin's Care, Face
Key Ingredients
Hyaluronic acid
OEM/ODM
Acceptable MOQ 10000Pieces
Delivery Time
35-45 Working Days For OEM
Payment
Trade Assurance TT