Applicable Industries
제조 식물, Laboratory
차원 (L*W*H)
600mmx600mmx1100mm
Keywords
Atomic Layer Deposition System
Substrate temperature
RT-400 degrees, control accuracy: ±1℃
Source container temperature
RT-200℃; ±1℃
Vacuum reaction chamber
316 stainless steel chamber
Plasma generation method
ICP
Plasma gas
O2, N2, NH3, H2
After-sales Service Provided
Field installation, commissioning and training, Field maintenance and repair service, Video technical support, Online support
After Warranty Service
Video technical support, Online support
Local Service Location
United Kingdom, United States