Applicable Industries
Semiconductor
코팅
Atomic Layer Deposition
차원 (L*W*H)
800 * 500 * 1000 mm
Product name
Atomic Layer Deposition Equipment
Keywords
Atomic Layer Deposition Equipment
Substrate size
4 -12 inches
Substrate temperature
RT-300℃
Precursor transport system
Standard 2 channel precursor pipeline
Deposition uniformity
Al2O3 uniformity <+/-2%
Substrate transport system
Manual /automatic optional
Deposition mode
High speed deposition mode
Processing capability
52 pieces- 4 inches