Nanomaker 작업대 소프트웨어

FOB 참조 가격:최근 가격 확인
  • >=1 단위
    US$22,699.00
배송:
지원 익스프레스 · 해상 화물
리드 타임::
수량(단위) 1 - 100 >100
예상 시간(일) 7 양도 가능
신고 의심스러운 활동
개요
빠른 세부 사항
제품 상태:
재고
유형:
Scientific Software
운영 체제 지원:
윈도우
버전 유형:
기업
유명 상표:
Nanomaker
모델 번호:
Wokrbench
원래 장소:
Canada
공급 능력
공급 능력:
100 Unit/Units per Month
포장 및 배송
패키지 정보
후 지불 당신은 액세스 링크 우리의 소프트웨어.
또한 모래 you CD 이 소프트웨어 경우.
포트
Toronto
리드 타임: :
수량(Units) 1 - 100 >100
예상 시간(일) 7 추후 협상
Nanomaker Workbench

NanoMaker is a powerful software/hardware system for SEM/FIB based lithography that is intended for state-of-the-art technology of designing and manufacturing micro and nano electronic devices and objects.

NanoMaker provides a unique set of tools for nanotechnologies.
It is supplied with friendly graphic editor to design hierarchical structures of any size and shape arranged to any level of complexity.
Calculates exposure dose values/times considering proximity effect correction for 2D/3D structures.
Makes simulation of resist development.
Compensates static distortion of e-beam deflecting system.
Significantly reduces total exposure time by actively suppressing dynamic delays of e-beam deflection.
Allows writing without beam blanking.
Seamlessly integrates Monte Carlo calculation to define exposure recommended parameters for multilayered resist-substrate systems.
Can be used as diagnostic tool for creation of high-resolution panoramic view of large-scale (centimeters) micro objects.

Elli30 PCIe Pattern Generator 
Fabrication of OVD with NanoMaker
 An example of patterning on a gold film,
resolution better than 10 nm was easily achieved
E-beam lithography with NanoMaker system and a lift-off process were used to pattern e-beam evaporation deposited Pd-Al electrodes contacting nanotubes.
Related Products

Nanomaker Full version http://www.nanomaker.com

Nanomaker/Writer http://www.nanomaker.com


Nanomaker/Writer Starter http://www.nanomaker.com

Purposes

To convert any scanning electron microscope (SEM) into an e-beam lithograph.
To provide an ultimate resolution of lithography with a certain setup (including industrial lithographs). To achieve this:
make correction for proximity effect during data preparation for lithography
compensate for the distortion and delays of scanning system during exposure and image acquisition
compensate for the system drift at prolonged exposure
To predict results of lithography by simulating.
To ensure adjustment for various configurations of lithographic equipment, for the presence or absence of beam blanking systems, stages, etc.
To create three-dimensional structures in a resist.
To familiarize user with the basic principles of lithography through the intuitive interface, logical sequence of operations and a solid theoretical basis.

Application area

Applications

Microelectronics
Nanotechnology, nanophysics
3D nano-micro patterning
Diffractive optics (synthetic holograms) for visible and X-ray range
Digital microscopy

Easily installed on:

SEM's (JEOL, LEO, ZEISS, HITACHI, PHILIPS, FEI, TESCAN,...)
Focused Ion Beam machines
STM/AFM's


If you are facing the problem of choice of a SEM, which could be used for e-beam lithography, or you have microscope, and you want to understand whether NanoMaker can be attached to it, please read our considerations and requirements here  http://www.nanomaker.com

Workbench

Software
Basic modules, including Editor, Import/Export, Experimental Recommended Parameters, Postprocessing, Proximity Effect Correction, Resist Development Simulation, Help. Other functions (such as Exposure, Image Acquisition, Stitching and Alignment of Exposure fields, Batch Processing, SEM inaccuracies Active Compensation for Distortion and Dynamic delays) are included only in Simulation (Training) mode.
Monte Carlo calculation of proximity function parameters is optional
Pattern Generator (Image) Emulator and Stage Emulation Drivers ( Emulator driver, Manual driver )
Drivers for Protection keylock
Hardware
Protection keylock

Workbench-EDU

Reduced version of Workbench edition for educational organizations.


Dear customers, for the universities and and other educational organizations we have Reduced version which includes:

Software
Basic modules, including Editor, Import/Export, Experimental Recommended Parameters, Postprocessing, Proximity Effect Correction (possibility is limited to number of elements in structure and simultaneously processed elements), Resist Development Simulation, Help. Other functions (such as Exposure, Image Acquisition, Stitching and Alignment of Exposure fields, Batch Processing, SEM inaccuracies Active Compensation for Distortion and Dynamic delays) are included only in Simulation (Training) mode.
Monte Carlo calculation of proximity function parameters is optional
Pattern Generator (Image) Emulator and Stage Emulation Drivers ( Emulator driver, Manual driver )
Drivers for Protection keylock
Hardware
Protection keylock

Full

Full version includes:

 Software
Basic modules (including Editor, Import/Export, Experimental Recommended Parameters , Postprocessing, Proximity Effect Correction, Resist Development Simulation, Exposure, Image Acquisition, Stitching and Alignment of Exposure fields, Batch Processing, SEM inaccuracies Active Compensation for Distortion and Dynamic delays, Help)
Monte Carlo calculation of proximity function parameters is optional
Drivers for Pattern Generator Board
Real (custom) Stage Driver (optional)
Pattern Generator (Image) Emulator and Stage Emulation Drivers ( Emulator driver, Manual driver )
Drivers for Protection keylock
Hardware
Pattern Generator board
Protection keylock

Packing & Delivery

After making a payment you will have an access to the link to download our software.
Also we can sand you CD with this software if you need.

당신이
원하는 정보가 아닌가요? 1회 요청, 여러 회 견적 지금 견적 받기 >>

다른 카테고리의 비슷한 제품들:

이러한 제품 및 공급 업체 결과는 사용자의 편의를 위해 언어 번역 도구로 자동 번역되었습니다. 번역 결과와 관련해 문제가 발견되는 경우, 언제든지 제안을 환영합니다.
이 페이지에 표시되는 영어 이외의 언어로 된 모든 제품 및 공급 업체 정보는 언어 번역 도구에 의해 자동으로 번역된 www.alibaba.com의 정보입니다. 자동 번역의 품질에 대한 문의나 제안이 있는 경우english.trans@service.alibaba.com으로 이메일을 보내주십시오. 번역은 순수하게 자동화된 과정으로 기술적 수단을 통해 완성됩니다. Alibaba.com은 어떠한 번역에도 참여하지 않았으며, 번역이나 제품 목록의 내용을 알고 있거나 통제하지 않습니다. Alibaba.com 및 그 계열사는 자동 번역된 정보 또는 언어 번역 도구의 기술적 오류로 인해 발생하는 손실에 대한 모든 보증, 명시적 또는 묵시적 책임을 명시적으로 부인합니다.